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R Dhamodharan
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R Dhamodharan
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R Dhamodharan
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Dhamodharan, Raghavachari
Raghavachari, Dhamodharan
Dhamodharan, R.
Iyengar, Dhamodharan R.
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3 results
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- PublicationPoly4-(1-hydroxyalkyl)styrene based photoresist materials: Design, synthesis and their lithographic performance(10-07-2006)
;Nasrullah, Mohammed J.Several synthetic approaches are available to make photoresist polymers for deep UV (DUV) lithography. Two approaches were widely used in semiconductor manufacturing: i) direct polymerization of corresponding monomers by (controlled) radical, (living) ionic polymerization ii) thermal or chemical catalyzed deprotection or protection of the macromolecules. The latter approach which is also called polymer modification chemistry (PMC) or polymer analogous chemistry offers several advantageous over the direct polymerization approach. In this presentation, we will provide an overview on the preparation and basic lithographically important characterization of new polymers based on poly(4-(1-hydroxyalkyl)styrene-co-styrene) [Poly(4-HAS-co-S)]. These polymers were synthesized for the first time by PMC and this methodology is an simple alternative for the synthesis of poly(4-HAS-co-S) than conventionally used synthetically challenging free radical or low temperature anionic polymerization of the protected monomer. We have synthesized high and low molecular weight (Mn) polymers with mole fraction of functional group ranging from partial to complete functionalization. Several formulations based on poly(4-HAS-co-S) were developed and tested for negative tone imaging at DUV lithography. Lithographic performance of these polymers at DUV lithography will be compared with their molecular weight and mole fraction of functional groups. - PublicationAmbient temperature grafting of N-VINYL carbazole on to the latent sites of polystyrene via atrp(22-09-2008)
;Vivek, A. V. - PublicationDielectric studies of hydrogen bonded polar binary mixtures of ethyl benzoate with aromatic amines(01-12-1999)
;Chitra, M.; ;Madhurima, V. ;Subramanyam, B.Murthy, V. R.K.The chosen liquids: ethyl benzoate, aniline and n-methyl aniline are high boiling point liquids for possible microwave applications. Dielectric measurements are carried out at 300 KHz, 5.59 GHz, 7.95 GHz, 33.7 GHz, 72 GHz and at optical frequency on the above polar liquids and their equimolar binary mixtures diluted in non-polar solvent (benzene). Cole-Davidson plot is obtained for the binary mixture of ethyl benzoate and aniline whereas Debye plot is observed for the binary mixture of ethyl benzoate and N-methyl aniline in dilute solutions of benzene. The binary mixture of an associated liquid aniline and non-associated liquid ethyl benzoate leads to formation of an extensive tree like hydrogen bonded system. In N-methyl aniline, where one hydrogen atom of the -NH2 group is replaced by a methyl group, it acts as a terminator to prevent hydrogen bonding. The experimentally determined dipole moments are compared with computational results obtained from semiempirical molecular orbital package MOPAC Version 6.0 and ab initio calculations using the Gaussian 92W program. The results are discussed.