Publication:
Effective Medium-Based Plasmonic Waveguides for Tailoring Dispersion

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cris.author.scopus-author-id55620570100
cris.author.scopus-author-id57221586993
cris.author.scopus-author-id7006223454
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cris.virtual.author-orcid0000-0002-2287-6295
cris.virtual.author-orcid0000-0001-6309-0531
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cris.virtual.departmentIndian Institute of Technology, Madras
cris.virtual.departmentIndian Institute of Technology, Madras
cris.virtualsource.author-orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
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cris.virtualsource.author-orcidb1921f7f-bda2-4ac6-8771-2ebc3418c4f6
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cris.virtualsource.departmentdf8fdd70-b2d3-468d-b94c-6faa3a92b069
dc.contributor.authorBalasubrahmaniyam, M.
dc.contributor.authorAbhilash, T.
dc.contributor.authorGanesan A R
dc.contributor.authorS Kasiviswanathan
dc.date.accessioned2023-09-20T05:31:38Z
dc.date.available2023-09-20T05:31:38Z
dc.date.issued15-09-2015
dc.description.abstractWe propose a waveguide configuration with a plasmonic grating for tailoring dispersion characteristics. The unit-cell of the plasmonic grating encompasses the subwavelength distribution of metal nanowires forming a highly resonant effective medium. The configuration enables independent control of the coupling between the plasmonic and waveguide modes via the resonant strength of the effective medium. Numerical simulations show that the line shapes of the coupled modes can be varied from Fano to electromagnetically induced transparency-like. Furthermore, we use the structure to enhance the group index from 250 to 850 and to broaden the associated band from 40 to 180 meV.
dc.identifier.doi10.1109/LPT.2015.2448124
dc.identifier.issn10411135
dc.identifier.scopus2-s2.0-84940398992
dc.identifier.urihttps://apicris.irins.org/handle/IITM2023/47548
dc.relation.ispartofseriesIEEE Photonics Technology Letters
dc.sourceIEEE Photonics Technology Letters
dc.subjectDispersion
dc.subjectElectromagnetic metamaterials
dc.subjectPhotonic crystals
dc.subjectPlasmons
dc.subjectSlow light
dc.titleEffective Medium-Based Plasmonic Waveguides for Tailoring Dispersion
dc.typeJournal
dspace.entity.typePublication
oaire.citation.endPage1968
oaire.citation.issue18
oaire.citation.startPage1965
oaire.citation.volume27
oairecerif.author.affiliation#PLACEHOLDER_PARENT_METADATA_VALUE#
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oairecerif.author.affiliationIndian Institute of Technology, Madras
oairecerif.author.affiliationIndian Institute of Technology, Madras
person.affiliation.cityChennai
person.affiliation.id60025757
person.affiliation.nameIndian Institute of Technology Madras
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