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  1. Home
  2. Indian Institute of Technology Madras
  3. Publication7
  4. Ferromagnetism and spin polarization in indium nitride, indium oxynitride, and Cr substituted indium oxynitride films
 
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Ferromagnetism and spin polarization in indium nitride, indium oxynitride, and Cr substituted indium oxynitride films

Date Issued
15-03-2014
Author(s)
Thapa, P.
Lawes, G.
Nadgorny, B.
Naik, R.
Sudakar Chandran 
Indian Institute of Technology, Madras
Schaff, W. J.
Dixit, A.
DOI
10.1016/j.apsusc.2014.01.025
Abstract
We have investigated the structural, electrical, and magnetic properties of both sputter deposited indium oxynitride and Cr substituted indium oxynitride films as well as InN films grown by molecular beam epitaxy. The degenerate oxynitride films exhibit n-type carrier concentrations in excess of 10 20 cm -3 and remain conducting to low temperatures, while the InN samples have much lower carrier concentrations and are insulating at low temperatures. At the same time all of these films show a room temperature ferromagnetic signal, with saturation magnetization ranging from 0.05 emu cm -3 for the indium oxynitride and InN films to 0.30 emu cm -3 for the Cr substituted film. Low temperature point contact Andreev reflection measurements find a spin polarizations from 46 ± 2% for indium oxynitride to 50 ± 2% for the Cr substituted films. These results highlight the potential of nitrides for spintronic applications. © 2014 Elsevier B.V. All rights reserved.
Volume
295
Subjects
  • Film

  • Indium oxide

  • Magnetism

  • Semiconducting

  • Spin polarization

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