Publication:
Photochemically assisted patterning: An interfacial hydrodynamic model perspective

Simple item page
cris.virtual.author-orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.author-orcid0000-0002-0064-6413
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.departmentIndian Institute of Technology, Madras
cris.virtualsource.author-orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.author-orcid07c27aaa-e1ef-460f-88df-1929bc38e179
cris.virtualsource.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.department07c27aaa-e1ef-460f-88df-1929bc38e179
dc.contributor.authorErekath, Swathi
dc.contributor.authorSreeram K Kalpathy
dc.date.accessioned2023-09-19T14:33:01Z
dc.date.available2023-09-19T14:33:01Z
dc.date.issued01-05-2022
dc.description.abstractPhotoresponsive organic liquids and polymers may undergo reversible photochemical reactions with accompanying change in chemical structure upon exposure to a suitable wavelength of light. Spatial variations in chemical structure can cause surface tension gradients along thin films of such materials, resulting in Marangoni flows when the material is in its fluid state. Consequently the fluid film can self-organize into topographical patterns. Here, we provide a hydrodynamic model perspective of photochemically assisted patterning in thin fluid films using principles of momentum and mass transfer. Photochemical reaction occuring simultaneously along with hydrodynamic flow is modelled. Dynamical variation of the photoproduct concentration, accounting for first order chemical reaction kinetics, is considered. Our simulations highlight the counteracting effects of reaction kinetics and Marangoni flow as the mechanism responsible for pattern evolution. We capture various pillar and hole array morphologies obtained by controlling the direction of Marangoni flow and reaction-induced mass transfer. The resolution and timescales of pattern formation are computed as function of experimental control parameters such as the reaction rate coefficient (K0), Marangoni number (M), and distance between the film and light source. A process map comparing feature sizes on a photomask (w) with those of the patterns evolved in the material is developed. It reveals optimum w − M and w − K0 combinations required for faithful reproduction of photomask feature sizes and deviation from ideally templated patterns.
dc.identifier.doi10.1016/j.icheatmasstransfer.2022.106031
dc.identifier.issn7351933
dc.identifier.scopus2-s2.0-85128505353
dc.identifier.urihttps://apicris.irins.org/handle/IITM2023/27993
dc.relation.ispartofseriesInternational Communications in Heat and Mass Transfer
dc.sourceInternational Communications in Heat and Mass Transfer
dc.subjectAdvection
dc.subjectDiffusion
dc.subjectMarangoni effect
dc.subjectPatterning
dc.subjectPhotochemical reaction
dc.subjectPhotoinduced dewetting
dc.titlePhotochemically assisted patterning: An interfacial hydrodynamic model perspective
dc.typeJournal
dspace.entity.typePublication
oaire.citation.volume134
oairecerif.author.affiliation#PLACEHOLDER_PARENT_METADATA_VALUE#
oairecerif.author.affiliationIndian Institute of Technology, Madras
person.affiliation.cityChennai
person.affiliation.id60025757
person.affiliation.nameIndian Institute of Technology Madras
person.identifier.scopus-author-id57224446890
person.identifier.scopus-author-id36344767000
Files
Collections
Publication1