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Microstructural dependence of penetration depth of Ag-doped YBa <inf>2</inf>Cu<inf>3</inf>O<inf>7-δ</inf> thin films probed by atomic force microscopy
Date Issued
01-12-1995
Author(s)
Pinto, R.
Kaur, Davinder
Rao, M. S.Ramachandra
Apte, P. R.
Srinivasu, V. V.
Vijayaraghavan, R.
Abstract
The magnetic penetration depth λ of laser ablated 5 wt % Ag-doped YBa2Cu3O7-δ thin films has been measured in the thickness range 1500-4000 Å and in the temperature range 18-88 K using microstrip resonator technique. A correlation of λ(T) with the film microstructure observed with atomic force microscopy has shown that λ(T) depends critically on the film microstructure. © 1996 American Institute of Physics.