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Optimization of ultrasonic cleaning for erosion-sensitive microelectronic components
Date Issued
01-01-2006
Author(s)
Indian Institute of Technology, Madras
Diwan, M.
Awasthi, P.
Shukla, A.
Sharma, P.
Goodson, M.
Awad, S.
Abstract
In this paper, we describe an experimental study undertaken to investigate ultrasonic fields in the frequency range 58-192 kHz with respect to their surface cleaning and erosion potential. Measurements are performed using three different methods - gravimetric weight-loss, surface profilometry, and precision turbidimetry - to assess these mechanisms for a variety of materials, including semiconductors. Conclusions are drawn regarding the nature of interaction between high-frequency, high-intensity ultrasonic fields and immersed surfaces. Recommendations are provided for optimal settings to maximize surface cleanability and minimize erodibility of sensitive substrates. © 2006 IEEE.
Volume
2006