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Approximations to Two-Step Diffusion Process by Prony's Method
Date Issued
01-07-1982
Author(s)
Selvakumar, C. R.
Abstract
A simple two-term approximation that is accurate over a wide range of drive-in ratios is given for the two-step diffusion process. Comparison with earlier approximations are graphically given. The final approximation is simple and convenient in evaluating the device performance. The Prony's method adopted to approximate erfc (x) is useful in approximating other profiles as well, such as anomalous diffusion profile of phosphorus, ion-implanted profile, etc. Copyright © 1982 by The Institute of Electrical and Electronics Engineers, Inc.
Volume
70