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    Optimization of ultrasonic cleaning for erosion-sensitive microelectronic components
    (01-01-2006) ;
    Diwan, M.
    ;
    Awasthi, P.
    ;
    Shukla, A.
    ;
    Sharma, P.
    ;
    Goodson, M.
    ;
    Awad, S.
    In this paper, we describe an experimental study undertaken to investigate ultrasonic fields in the frequency range 58-192 kHz with respect to their surface cleaning and erosion potential. Measurements are performed using three different methods - gravimetric weight-loss, surface profilometry, and precision turbidimetry - to assess these mechanisms for a variety of materials, including semiconductors. Conclusions are drawn regarding the nature of interaction between high-frequency, high-intensity ultrasonic fields and immersed surfaces. Recommendations are provided for optimal settings to maximize surface cleanability and minimize erodibility of sensitive substrates. © 2006 IEEE.